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A new fabrication process, which includes deposition of thin silver film on silicon surface prior to wet etching, is proposed for realizing aligned silicon nanowires with high uniformity, resulting in black nonreflecting silicon surface.
Vertically aligned copper indium diselenide nanorod arrays were synthesized by electrodeposition using porous anodic alumina template supported on a tungsten/silicon substrate. Porous anodic alumina template was fabricated by anodizing aluminium film which was sputtered onto tungsten/silicon substrate. The approach employed a selective chemical etching to penetrate the barrier layer at the bottom...
We report here the successful fabrication of large-area size-and site-controlled periodic arrays of Si nanowires by employing the colloidal nanosphere lithography technique and Au-assisted selective chemical etching process. The vertically-aligned Si nanowires with diameters down to 190 nm and 90 nm were selectively formed at particular positions on the pre-patterned (001)Si substrates. All the Si...
An efficient suppression of reflection in a broad spectral range can be achieved when the textured scale is comparable to the wavelength of incident light. The nano-scale texturing method is, therefore, attracting many interests in many fields. In this study, a fast nano-scale texturing method for the crystalline silicon substrate has been provided. By using the self-assembly polymer mask and wet...
A new approach to fabricating nanopore is presented. It is based on focused ion beam (FIB) sputtering to mill through a silicon nitride (Si3N4) membrane first, then followed by aluminum nitride (AlN) thin film deposition through the milled hole to narrow the pore size. FIB sputtering properties of Si3N4 membranes were investigated in order to achieve high aspect ratio holes through the membrane. The...
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