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Method of formation of regular PAA without a barrier layer in the process of anodizing of Al-film on n-type Si has been developed. Semiconductor InGaN-structures were selectively grown in modified PAA-template by MO VPE. Formed self-organized nanostructures InGaN have nonpolar crystallographic α-orientation. Investigations of luminescent properties and analysis of the spectral characteristics have...
We have improved in-plane uniformity of crystal shape for InGaAs micro-discs using a multi-step growth in micro-channel selective-area metal-organic vapor phase epitaxy on Si(111) substrates. The multi-step growth employs a gas flow sequence in which the partial pressure of a Ga source is modulated to control the initial nucleation and the growth mode. At the initial stage of growth, we grew InAs...
We studied the effect of iodine doping of CdTe films on Si substrates grown by MOVPE at different growth conditions. A high resistivity film was obtained by adjusting the growth temperature, Te/Cd precursor flow ratio and the dopant flow-rate. Our results show the film resistivity does not change linearly with the dopant flow-rate. The resistivity remains low and similar to that of undoped value for...
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