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The response of ordered ultrathin Al 2 O 3 films on NiAl(110) and Ni 3 Al(110) substrates to sequential exposures at varying pressures of H 2 O between 10 −7 Torr and 10 −3 Torr, ambient temperature, was characterized by LEED, AES and density functional theory (DFT) calculations. In all cases, an increase in average oxide thickness, as determined by...
The oxidation of the (100), (110) and (111) surfaces of the intermetallic compound FeAl has been investigated using LEED and XPS. On all three surfaces, oxidation at room temperature leads to the formation of an amorphous oxide film on top of an Al-depleted interlayer. The film growth can be divided into two regions of differing kinetics, i.e. the initial formation of a closed oxide film and a subsequent...
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