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Zinc oxide (ZnO) film was deposited on a glass substrate by rf magnetron sputtering with O 2 /Ar as working gases. Structural properties of the films were characterized by XRD. Average crystallite size in the films was strongly dependent on both the gas flow ratio of O 2 /Ar and rf-power at a constant deposition pressure. During the deposition, energetic species in the plasma were...
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