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This paper reports a novel maskless nanoscale material etching method based on microplasma devices arrays. That is, inverted pyramidal microplasma devices arrays are integrated into the scanning probe tips array to realize maskless nanoscale material etching with advantages of high efficiency, large area and low cost. A 4×4 inverted pyramidal microplasma device array with each microcavity dimension...
We report on the systematic studies of reactive-ion etching (RIE) conditions for zinc oxide (ZnO) films with methane and hydrogen gases. The etching conditions were optimized to ensure high selectivity of ZnO to poly(methyl methacrylate) (PMMA), which is commonly used as an etching mask in nanolithography. We also show the feasibility of fabricating nanofeatures patterned onto a thin layer (<200...
The power consumption and the matching will be the principal issues at the 32 nm node and below. In this context, Ultra-Thin Body devices are extensively studied for the end-of-roadmap CMOS. In this paper we present the SON technology, leading to the simple fabrication of sustained mono-Si nano-membranes over an empty tunnel, and discuss on the application of this process to build-up electronic devices...
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