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Reliability of metal-oxide-semiconductor field-effect-transistor (MOSFET) devices is a growing concern as the scaling of these devices is increased. Major contributors to the reliability issues of MOSFET devices include negative bias temperature instability (NBTI) in p-type MOSFET. NBTI phenomena causes threshold voltage shift (increasing Vt) of pMOS devices over time. This results in slow down of...
A new power gated 6T SRAM circuit is proposed in this paper to suppress leakage power consumption in data retention SLEEP mode. A new write assist circuitry is presented to enhance the write margin of the new power gated memory circuit. Design tradeoffs among data stability, power consumption, and write margin are evaluated with different SRAM circuits. The leakage power consumption is reduced by...
In this work we have demonstrated, for the first time, a 0.605μm2 dual core oxide (DCO) dual Vdd 8T SRAM cell in 45 LPG triple gate oxide CMOS process for use as L1 cache for high performance low leakage mobile applications. The DCO 8T SRAM operates under dual voltage supplies with write assist. Compared to traditional single-end 8T cell, DCO 8T SRAM showed the same performance with only half the...
The minimum operating voltage (Vmin) of nano-scale LSIs is investigated, focusing on logic gates, SRAM cells, and DRAM sense amplifiers in LSIs. The Vmin that is governed by SRAM cells rapidly increases as devices are miniaturized due to the ever-larger variation of the threshold voltage (VT) of MOSFETs. The Vmin, however, is reduced to the sub-one-volt region by using repair techniques and new MOSFETs...
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