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Gate density is ultimately increased to 2100 kGates/mm2 by pushing the critical design rules without increasing the circuit margin in 45 nm technology. Layout dependences for stress enhanced MOSFET including contact positioning, 2nd neighboring poly effect, and bent diffusion are accurately modeled for the first time. With the constructed design flow, gate length change of -2.8% to +3.6% and Idsat...
This paper considers mechanical stress and strain in a piezoresistive cantilever sensor under surface stress loading, which is the loading condition that occurs in biochemical sensing applications. Finite element simulations examine the piezoresistor sensitivity due to changes in cantilever length, width, and thickness, and piezoresistor size, location, and depth. A few unexpected results are found...
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