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Antireflection nano structure was formed by simple wet chemical etching using catalysis of gold (Au) or silver (Ag) nanoparticle. Single nano-sized particle dispersion solution was coated onto Si(100) substrate with polished surface. Then, the samples were soaked in an aqueous etching solution of hydrofluoric acid and hydrogen peroxide. The surface of etched Si substrate appeared black, and the reflectivity...
We fabricated black silicon solar cells with conversion efficiency of 16.8% on p-type single crystal Si wafers with a conventional diffused emitter and Al back-surface field (BSF). We replaced the anti-reflection coating step with a single 3-minute `black-silicon' etch of the bare wafer before processing. The nanoporous black-silicon layer, about 300-nm thick is produced in a 3-minute single-step...
SiN/sub x/ films prepared by catalytic chemical vapour deposition (Cat-CVD) are applied to passivation and antireflection coating for crystalline Si solar cells. SiN/sub x/ passivation by Cat-CVD with or without nitridation before SiN/sub x/ deposition was examined. Both quite high carrier lifetime of 600 /spl mu/s and low surface recombination velocity of 20-30 cm/s were obtained and these values...
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