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In this work, polycrystalline zinc nitride films were prepared on Si and glass substrates by rf magnetron sputtering in N2 ambient using Zn as a target. Substrate temperature (Ts) was different for each deposition process ranging from 298 K to 523 K. Optical transmission experiments showed that the optical band gap of the resultant layers decreased as Ts increased. X-ray diffraction scans presented...
Indium Tin Oxide (ITO) film is evaporated on the PEN film using MirrorTron Sputtering system, which is a new sputtering system enabling sputter deposition at a low temperature, separating a sputtering chamber and a deposition chamber. As a result, a uniform ITO thin-film deposition with a film thickness of 150 nm is enabled. This ITO thin-film is chemically analyzed using Focused ion beam and X-ray...
Transparent conductive titanium-doped indium oxide (ITiO) films were prepared on soda-lime glass substrate using an RF magnetron sputter source. The electrical and optical properties of the transparent conductive ITiO film and the photovoltaic performance of the prepared DSCs were examined. The ITiO thin films containing 5 wt.% Ti showed the minimum resistivity of rho = 5.25times10-3 Omega-cm. The...
Integration of electronics and photonics causes greater requirement for development of electrical and optical activated thin films for a new field of application known as transparent electronics. One of the key materials which is necessary for production of functional elements in transparent electronics devices are transparent oxides semiconductors (TOSs). The TOSs can be applied in many practical...
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