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Fabrication and optical testing of high-aspect-ratio 1D photonic crystals, obtained by electrochemical micromachining of silicon, are discussed in this paper. The devices consist of high-aspect-ratio periodic (P=4 mum) arrays of 1.22-mum-thick silicon walls separated by 2.78-mum-wide air gaps, with 100 mum etching depth. They were designed as hybrid quarter-wavelength reflectors with photonic bandgaps...
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