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This paper examines the usefulness of N-curve metrics for a 65 nm SRAM cell operating in sub-threshold region. Various N-curve metrics are evaluated with changing power supply voltage, temperature, cell ratios, pull up ratios and oxide thickness. N-curve metrics are also evaluated considering the effect of intra die and inter die random threshold voltage variations. Results indicate that N-curve method...
The paper presents a detailed study on the idle leakage reduction techniques on partially depleted silicon-on-insulator (PD-SOI) CMOS SRAM. The most promising leakage reduction techniques that have been proposed are introduced, analyzed and compared into 65 nm low-power PD-SOI technology, taking into account all the SOI specific effect. Especially, it is shown that the leakage reduction techniques...
Data retention power gating is a commonly used method for leakage reduction in deep submicron SRAM. However, application of such methods result into reduced stability of the SRAM bitcell. Moreover, reducing supply voltage and increasing process variation put a limitation on such usage in deep submicron processes. Present scheme describes a method to enhance stability while applying such data retention...
This paper presents an innovative structure based on 3 dimensional integration technology, where ultra thin inter layer dielectric enables a dynamic threshold voltage (VTH) control. A sequential process flow is proposed to fabricate 3D devices with dynamically tunable VTH. This ability can be exploited to design SRAMs cells with increased stability and surface density compared to planar technology...
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