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A tunable grating is fabricated by micromachining a GaN crystal layer grown on Si substrate. The tunable grating consists of grating lines, electro-static comb-drive actuator and connection springs. The grating consists of 85nm wide, 12μm long 24 grating lines with 674nm period. The crystallization stress of an HfO2 layer deposited on the GaN crystal is used to compensate the residual stress of the...
In this letter, we are demonstrating that the fluidic assisted heterogeneous integration is an efficient integration method of various photonic devices with standard silicon electronic devices to realize advanced photonic integrated systems. By using a thin-film device format, which is optimized in its host substrate, its integration on silicon substrate does not interfere with a post layer-by-layer...
We describe the fabrication and performance of micro-mirror for silica waveguides on silicon substrate. The micro-mirror consists of four facets, which is produced by wet-etching a pyramid-shaped pit on the backside of the Si-substrate and transferring it to silica waveguide by dry-etching. This mirror couples waveguide light normal to waveguide plane. We developed a trench-filled 0.45Delta% Ge-doped...
Plasma-exposed Si surface related to Si recess in source/drain region was investigated in detail for various superposed bias configurations with frequencies of 13.56 MHz and 400 kHz. Two different bias powers were utilized by an inductively coupled plasma reactor (ICP). The surface layer (SL) and the interfacial layer between the SL and Si substrate (IL) were analyzed by spectroscopic ellipsometry...
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