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Through-Silicon-Via (TSV) processing is critical to 3D chip stacked integrated circuit (IC) technology. The understanding and management of the induced stresses in silicon due to coefficient of thermal expansion (CTE) mismatch is critical for the successful implementation of this process in circuit design and production. Most TSVs in these applications are copper (Cu) filled. Analysis of Cu-filled...
With the most popular electronics products being the slimmest ones with the highest functionality, the ability to thin, stack and interconnect chips is becoming more important. One method to accomplish this is by using the through silicon via (TSV). This is a means of electrical connection in 3D stacked devices that saves space and shortens the electrical interconnect length, improving electrical...
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