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X-ray photoelectron spectroscopy studies and first principles calculations compare Cu adsorption on heavily hydroxylated α-Al 2 O 3 (0001) with dehydroxylated surfaces produced by Ar + sputtering followed by annealing in O 2 . Annealing a cleaned sapphire sample with an O 2 partial pressure of ~5x10 -6 Torr removes most contaminants, but leaves...
X-ray photoelectron spectroscopy (XPS) studies have been carried out on sputter deposited copper on a substantially hydroxylated α-Al 2 O 3 (0001) (sapphire) surface under ultra-high vacuum (UHV) conditions. XPS-derived Cu uptake curves show a sharp change in slope at a coverage of 0.35ML (on a Cu/O atomic basis), indicative of initial layer-by-layer growth. Cu(LMM) lineshape data...
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