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Nitric–phosphoric (NP) acid etching has been regarded as one of the most effective methods for the formation of low resistance back contact with the metal electrode in CdTe based photovoltaic cells. We studied CdTe back surfaces and the changes with time of exposure to NP acid with x-ray photoelectron spectroscopy (XPS), and atomic force microscopy. Strong etching dependence on the back surface chemical...
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