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We have studied ultraviolet laser-induced monolayer etching process on Cl-adsorbed Si(111)-7x7 surfaces with X-ray photoemission spectroscopy. We keep the fluence as low as 1 mJ/cm 2 to discuss electronic excitation and relaxation at the surface during this process. After irradiation, silicon di- and tri-chloride species on the surface disappear and monochlorides remain at the surfaces. We...
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