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Atomically sharp epitaxial growth of Bi 2 Se 3 films is achieved on Si(111) substrate with molecular beam epitaxy. Two-step growth process is found to be a key to achieve interfacial-layer-free epitaxial Bi 2 Se 3 films on Si substrates. With a single-step high temperature growth, second phase clusters are formed at an early stage. On the other hand, with low temperature...
MBE growth and properties of InAs nanoscale islands formed on silicon are reported. Islands capped with Si emit a photoluminescence band in the 1.3 μm region. Upon annealing at increased substrate temperature, extensive interdiffusion leads to the formation of an InAs solid solution in the Si cap layer. Additionally, InAs-enriched regions with extensions of ∼6 nm, exhibiting two kinds of ordering,...
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