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In this work, we study the nanostructuring effects of nanosecond laser irradiations on 5nm thick Au film sputter-deposited on Si. After deposition of Au on Si substrate, nanosecond laser irradiations were performed increasing the laser fluence from 750 to 1500mJ/cm 2 . Several analyses techniques, such as Rutherford backscattering spectrometry, scanning electron microscopy, atomic force microscopy,...
We describe the excimer-laser-induced crystallization of microcrystalline silicon films deposited by plasma-enhanced chemical vapor deposition (PECVD). Microcrystalline silicon films containing 2 at.% hydrogen can be used as precursor films for the laser recrystallization process without a dehydrogenation step, and provide a wider laser energy fluence process window than the previous explosive recrystallization...
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