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The growth of Ni films by d.c. magnetron sputtering onto MgO (100) substrates was investigated with the aim of producing epitaxial smooth Ni layers for magnetic multilayer applications. Growth temperatures ranging from 20 to 700°C for 200nm thick Ni films were examined. At a reduced temperature, 20°C, a complex texture dominated by 〈022〉 orientated grains co-existing with 〈14̄1〉 and traces of 〈002〉...
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