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We have developed a silane-free atmospheric-pressure plasma Si deposition process and investigated the properties of the deposited films by fabricating strain gauge type pressure sensors for the first time. The Si deposition process, which is known as plasma-enhanced chemical transport, utilizes the temperature difference between the solid Si source and the substrate in atmospheric hydrogen plasma...
This paper reports on the production of carbon coatings onto a silicon substrate, using a lower power radiofrequency (RF) generator, combined with a plasma immersion ion implantation (PHI) driver. An RF, 13.6 MHz, generator operating at 30 W, was used to produce plasmas using a mix of C2H2 and H2 as feeding gas. In the experiments, a mirror polished silicon (100) substrate is exposed to the RF plasma...
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