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We have grown functionalized CNT using the resist-assisted patterning process. The single have enhanced and very stabilized electron emission. We obtained the long term stability which the field emission current of the single emitters remains stable up to 20 hrs. The single emitters can be used in the vacuum nano-electronics devices. More detail electron emission properties should be delivered in...
Large band gap materials such as diamond (5.5 eV) and AlN (6 eV) offer the possibility of making MEMS structures out of a single material by varying the doping level to achieve the semi-conducting, metallic and insulating (undoped) properties needed in a typical MEMS structure. Polycrystalline diamond (poly-C), which has recently been used in the fabrication of BioMEMS, RFMEMS, and MEMS packaging,...
The room-temperature THz spectrum of graphite nanoplatelets shows a free carrier absorption at zero frequency with an electronic scattering rate of 175 cm-1 (3.3 times 1013 rad/s) and plasma frequency of 1675 cm-1. The lack of a major change in Drude plasma frequency down to 4.2 K implies any band gaps in graphite nanoplatelets are less than 1 meV.
Novel dual-scaled superhydrophobic nano-flower surfaces were fabricated by 1-mask photolithography, DRIE and carbon nanotube (CNT) microwave plasma enhanced CVD (MPCVD). Patterned structure was characterized by SEM, TEM and AFM techniques. With the additional petal-like CNT structure, the apparent contact angle (ACA) increased dramatically compared with silicon (~140%) and parylene-coated (~78%) micropillar...
We discuss the use of electron-shading effect during the plasma-enhanced chemical vapor deposition to control the growth of carbon nanotubes (CNTs). We designed and fabricated the trench and island test structures. The horizontally aligned CNTs were grown from the sidewall of the polysilicon structure, parallel to the silicon oxide surface. We investigated the electrical property of the CNT number...
This paper reports on the production of carbon coatings onto a silicon substrate, using a lower power radiofrequency (RF) generator, combined with a plasma immersion ion implantation (PHI) driver. An RF, 13.6 MHz, generator operating at 30 W, was used to produce plasmas using a mix of C2H2 and H2 as feeding gas. In the experiments, a mirror polished silicon (100) substrate is exposed to the RF plasma...
Fluidized bed reactors are widely used in chemical engineering, but recently there is also increasing interest for processing particulate advanced materials in fluidized bed reactors. Examples include heat treatment, plasma-assisted surface treatment, etching, and coating. In this paper, a novel process for deposition of thin metallic and metal-nitride coatings on particulate substrates is reported...
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