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This paper reports a rapid and simple method for the co-deposition of TiO2/SiO2 films, using a microwave plasma torch and organometallic precursors. Both structure and microstructure of the films have particularly been investigated. The results show that the characteristics of the deposits mainly depend on the torch to substrate distance (d). When this distance is short (d=10mm), the co-deposits are...
Porous structured films grown with the glancing angle deposition technique have been widely studied for thin film optical device applications. We report the use of ion assistance to modify the structural and optical properties of porous silicon dioxide and titanium dioxide columnar thin films grown at deposition angles of 70° and 85°. Optical characterization studies show that tilted columnar structures...
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