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Titanium dioxide (TiO 2 ) films have been deposited on Si substrates using reactive magnetron sputtering. The resulting films, having a polycrystalline anatase phase with a dense columnar structure, were analysed by time-of-flight elastic recoil detection analysis (ToF-ERDA) using 40MeV I 9+ ions. A clear decrease in the areal atomic density (atoms/cm 2 ) of Ti and O was observed...
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