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As device dimensions have reduced to nanometer length scales, rapid thermal processing (RTP) has emerged as the key approach for providing the low thermal budget and ultra-pure process conditions that are essential in advanced fabrication schemes. As further progress in electronic technology becomes increasingly dependent on success in rapid development cycles that include both materials innovations...
To meet the requirements of smaller devices while still maintaining high performance, it is necessary to form very shallow source/drain extensions with very high activation. Although significant progress has been made in meeting these requirements as outlined in the 2003 ITRS, continued progress in meeting the needs for the 65 nm technology generation and beyond remain a challenge. It will no longer...
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