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X-ray photoelectron spectroscopy was used to characterize the oxidation of Ni 3 Al(110) and interaction of the oxide film at ambient temperature with increasing pressures of water vapor (10 -6 -5 Torr). The Ni 3 Al(110) substrate was oxidized in 10 -6 Torr O 2 at 800 K followed by annealing to 1100 K. The Ni(2p), Al(2p) and O(1s) spectra were monitored...
The growth of a titanium thin film on the α-Al 2 O 3 (0001) surface occurs in two steps. In the first stage, titanium is oxidised via a chemical reaction with the surface oxygen species which are characterised by a shift of 1.5 eV of the O 1s level. These species involve removable OH groups ((5+/-2)x10 14 /cm 2 at saturation) and-likely-residual OH groups ((3+/-1...
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