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SOI FinFET transistors have emerged as novel devices having superior controls over short channel effects (SCE) than the conventional MOS transistor devices. However despite these advantages, these also exhibit certain other undesirable characteristics such as corner effects, quantum effects, tunneling etc. Usually, the corner effect deteriorates the performance by increasing the leakage current. In...
A vertically configured nanodiamond vacuum field emission transistor (VFET) is developed. The device is fabricated on a silicon-on-insulator (SOI) substrate, using the active silicon layer patterned with inverted pyramidal mold for nanodiamond deposition and as the self-aligned gate of the final VFET construct. Gate modulation of the emission current is observed with a relatively low gate turn-on...
This paper presents the results of extensive simulations on the characterization of asymmetrical channel device, namely Dual material Gate Fully Depleted Silicon On Insulator (DMG-FD-SOI) in the sub-100nm dimensions with emphasis on the analog, radio frequency (RF) performances and short channel effects (SCEs). The obtained results may serve as useful guidelines to get a basis overview of this gate-material...
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