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Silicon nanowires are a promising solution to address the increasing challenges of fabrication and design at the future nodes of the complementary metal-oxide-semiconductor (CMOS) technology roadmap. Despite the attractive opportunity that offers their organization onto regular crossbars, the problem of designing the nanowire decoder is still challenging and highly dependent on the nanowire fabrication...
This paper describes several methodologies based on a pulsed laser beam to reveal the architecture of a high integrated SDRAM, and the different classes of Single Event Effects that can occur due to cosmic radiations. At cell level, laser is used to reveal an important technological parameter: the lithography process. At memory array level, laser is a powerful tool to retrieve cell physical arrangements,...
Transconductance (gm) enhancement in n-type and p-type nanowire field-effect-transistors (nwFETs) is demonstrated by introducing controlled tensile strain into channel regions by pattern dependant oxidation (PADOX). Values of gm are enhanced relative to control devices by a factor of 1.5 in p-nwFETs and 3.0 in n-nwFETs. Strain distributions calculated by a three-dimensional molecular dynamics simulation...
Novel 3D stacked gate-all-around multichannel CMOS architectures were developed to propose low leakage solutions and new design opportunities for sub-32 nm nodes. Those architectures offer specific advantages compared to other planar or non planar CMOS devices. In particular, ultra-low IOFF (< 20 pA/mum) and high ION (> 2.2 mA/mum) were demonstrated. Moreover, those transistors do not suffer...
An important driving force behind the microelectronics industry is the ability to pack ever more features onto a silicon chip, by continually miniaturising the individual components. However, after 2015 there is no known technological route to reduce devices below 10 nm. We demonstrate a complete fabrication strategy towards atomic-scale device fabrication in silicon using phosphorus as a dopant in...
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