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Low frequency (100 kHz) discharge in Ar-H2 and CH3SiCl3-Ar-H2 mixtures was studied to obtain information on the processes involved in plasma deposition of SixCy:H films from CH3SiCl3-Ar-H2 plasma once the properties of Ar-H2 plasma are known. The plasmas were studied using optical emission spectroscopy. The addition of small amounts of nitrogen to the plasma mixtures also permitted the use of an actinometry...
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