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This paper describes a highly accurate dose control circuit (DCC) for the emission of a desired number of electrons from vertically aligned carbon nanofibers (VACNFs) in a massively parallel maskless e-beam lithography system. The parasitic components within the VACNF device cause a premature termination of the electron emission, resulting in underexposure of the photoresist. In this paper, we compensate...
In this paper, we present an empirical study of dynamic behavior of an electron source system which incorporates an individual CNT. We propose a representative circuit model that is simple yet particularly valuable for emission current control for each CNT emitter in an array to facilitate high throughput maskless lithography.
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