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CdS thin films of 150nm thick were grown by sputtering technique on top of commercially available FTO coated glass substrates. The films are oxidized by subsequently annealed in oxygen ambient at 350°C. XRD, EDX, FTIR analysis, UV–vis spectrometry and Hall Effect measurement were used to characterize the films. XRD studies confirm the polycrystalline nature of the deposited films with phase transition...
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