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The SRAM operating margin in 65 nm technology is analyzed. The peak characteristic in the read margin versus the supply voltage was found to be caused by the channel length modulation effect. Controlling the memory cell virtual ground line proved to be effective in enlarging the operating margin simultaneously in the read and the write operations. A simple optimum circuit which does not require any...
The implementation of complex functionality in low-power nano-CMOS technologies leads to enhance susceptibility to parametric disturbances (environmental, and operation-dependent). The purpose of this paper is to present recent improvements on a methodology to exploit power-supply voltage and temperature variations in order to produce fault-tolerant structural solutions. First, the proposed methodology...
The paper presents a detailed study on the idle leakage reduction techniques on partially depleted silicon-on-insulator (PD-SOI) CMOS SRAM. The most promising leakage reduction techniques that have been proposed are introduced, analyzed and compared into 65 nm low-power PD-SOI technology, taking into account all the SOI specific effect. Especially, it is shown that the leakage reduction techniques...
In this work, the bulk-gate controlled circuit to improve the power supply ripple ratio (PSRR) of a Low Dropout Regulator (LDO) which deteriorates due to lowering power consumption is proposed. Designing with 0.25 mum CMOS process, the simulation results by HSPICE shown that the proposed circuit provides a high performance of PSRR even though 1/10 of the power consumption is reduced compare to the...
Class D amplifiers are becoming the most feasible solution for embedded audio application. However, distortions due to the non-linear nature of switching stage are the main drawback for this amplifier topology. This paper discusses the design and implementation of high fidelity audio class D using sliding mode control scheme. This design method proves to be a cost effective solution for industrial...
Novel 3D stacked gate-all-around multichannel CMOS architectures were developed to propose low leakage solutions and new design opportunities for sub-32 nm nodes. Those architectures offer specific advantages compared to other planar or non planar CMOS devices. In particular, ultra-low IOFF (< 20 pA/mum) and high ION (> 2.2 mA/mum) were demonstrated. Moreover, those transistors do not suffer...
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