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In article number 1801032, Tae Geun Kim and co‐workers use AlN thin film electrodes with nanoscale indium/tin conducting filaments produced by the application of electric fields for nitride‐based microlight‐emitting diodes (μLEDs). These μLEDs exhibit much improved performance in terms of light emission as well as injection current density, owing to the ultra‐high transmittance and efficient hole‐injection...
Microlight‐emitting diodes (µLEDs) are emerging solutions for both high‐quality displays and lighting technologies. However, the overall light output power density of these devices is low, as the emission area is shielded by the p‐electrodes required for current injection. In this study, instead of the more conventionally used indium tin oxide (ITO), an AlN thin film with nanoscale conducing filaments...
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