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The relative rates of adsorption and irreversible reaction are modeled for a prototypical atomic layer deposition (ALD) system. Surface species balance modeling equations are processed through a reaction factorization procedure to eliminate redundant dynamic modes. The resulting singular perturbation problem then is used to develop a criterion that distinguishes between mass‐transfer and kinetically‐limited...
Experiments and computations are performed for the metalorganic chemical vapor deposition (MOCVD) of aluminum (Al) from dimethylethylamine alane (DMEAA). The deposition rate as a function of the substrate temperature and the evolution of the deposition rate along the radius of the susceptor are experimentally determined, in a vertical, warm wall MOCVD reactor operating at 10 Torr, in the temperature...
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