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A 2D Monte‐Carlo etching model of InP by a Cl2/Ar/N2 plasma discharge coupled to our kinetic plasma model and sheath model have been developed. It allows prediction of geometrical and chemical profile of etched trenches versus the operating conditions. The plasma kinetic model is performed to quantify reactive species densities and fluxes of Cl, N, and positive ions. The latter are introduced as input...
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