Ni‐based superalloys with Al‐contents between 3 and 5 wt% exhibit insufficient oxidation resistance at temperatures above 900 °C. A change of the oxidation mechanism has been achieved after doping surface‐near regions with fluorine by ion implantation and subsequent heat treatment. With that, the formation of a protective alumina scale was observed. This study is dedicated to the nature of the kinetic bias for the alumina scale formation. The samples of alloy IN738 (3.5 wt% Al) were implanted with F‐ions (1017 F/cm2 at 38 keV). The depth profiles of O, Ni, Cr, Co, Ti, and Al were determined using secondary neutrals mass spectrometry (SNMS), whereas the F‐depth profiles were measured by non‐destructive proton‐induced gamma‐ray emission (PIGE). Directly after F‐implantation no Al‐enrichment near the surface was observed. After heating up to temperatures between 400 and 800 °C, no distinct alumina scale formation was observed. At 1000 and 1050 °C, a distinct Al‐rich region has formed. Extending the oxidation time up to 12 h leads to a pronounced Al‐profile, suggesting the growth of a pure alumina scale near the surface.