In the last decade, there has been a tremendous increase in the number of techniques for patterning materials on the nanoscale (10-100nm), driven by numerous potential applications, for example, in sensing[1], data storage [2], optoelectronic [3], display [4], nanofluidic [5], and biomimetic [6] devices. An ideal nanolithography technique would be able to: (1) write with nm resolution; (2) write with speeds of multiple centimeters per second (while preserving nanometer scale registry) for wafer-scale lithography; (2) impart different chemical functionality and/or physical properties (with or without topographical changes) as desired; (4) function in different laboratory environments (for example, under ambient pressure or in solution); (5) be capable of massive parallelization for both writing and metrology; and (6) write on a variety of materials deposited on a variety of substrates. Specific applications will require one or more of the attributes described earlier, but the most versatile technique would encompass as many as possible. To our knowledge, no technique currently in practice can simultaneously attain all of these features.