The use of continuous load and depth monitoring indentation methods for measuring the mechanical properties of small volumes in conjunction with orientation imaging microscopy (OIM) and atomic force microscopy (AFM) is presented for a model system. Because many materials for microelectronics are processed in hydrogen-containing atmospheres, a model system is needed to show how OIM and AFM can be coupled to determine slip behavior on the nanometer to micrometer length scale as a function of hydrogen concentration. Atomic force microscopy imaging alone is not able to quantify the slip behavior, but coupling AFM and OIM demonstrates how changes in hardness can be linked to changes in slip band formation.