The relative rates of plasma homo- and Copolymerizations of ethylene, vinyl fluoride, vinylidene fluoride, trifluoroethylene and tetrafluoroethylene (VF x , x = 0–4, respectively) were determined in an rf, capacitively coupled, tubular reactor with external electrodes using identical plasma parameters. The deposition rates for VF x (x = 1–3) and 20 different monomer blends, when plotted versus the F/C ratios of the monomers or monomer blends, followed a concave-downward curve situated above the straight-line joining the rates for VF0 and VF4. The deposition rates for VF m /VF n blends (m = 3 or 4; n = 0–2) likewise yielded concave-downward curves situated above the straight lines joining the rates for the respective monomers; the rates for VF m /VF n blends (m = 0 or 1; n = 1 or 2) yielded concave-upward curves situated below the straight lines joining the rates for the respective monomers; while the rates for VF3/VF4 blends fell along the straight line joining the rates for VF3 and VF4. The mechanisms for plasma (co) polymerizations of VF x monomers responsible for the wide range of relative deposition rates remain to be elucidated.