AFM (atomic force microscope) scratching is a simple yet versatile material removing technique for nanofabrication. It has evolved from a purely mechanical process to one in which the tip can be loaded by additional energy sources, such as thermal, electric, or chemical. In this chapter, scratching techniques using tips with both single and dual sources are reviewed with an emphasis on associated material removing behavior. Recent developments in scratching systems equipped with automated stages or platforms using both single tip and multiple tips are assessed. The characteristics of various approaches for scratching different types of materials, including polymers, metals, and semiconductors, are presented and evaluated. The effects of the major scratching parameters on the final nanostructures are reviewed with the goal of providing quantitative information for guiding the scratching process. Advances in several techniques using dual sources for AFM scratching are then studied with a focus on their versatility and potential for different applications. Finally, following a section on the applications of AFM scratching for fabricating a fairly wide range of nanoscale devices and systems, concluding remarks are presented to recommend subjects for future technological improvement and research emphasis, as well as to provide the author’s perspective on future challenges in the field of AFM scratching.