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Two types of capacitive dual-frequency discharges, used in plasma processing applications to achieve the separate control of the ion flux, Гi, and the mean ion energy, <Ei>, at the electrodes, operated in CF4, are investigated by particle-in-cell simulations: (i) In classical dual-frequency discharges, driven by significantly different frequencies (1.937 MHz + 27.12 MHz), <Ei> and Гi are...
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