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The monitoring mechanism uses in-line data which is conservative stratification and grouping to calculation %Bias. (%Bias=bias/process variation.) It represents tools are significant difference when %Bias>10% referring to MSA 2nd manual. As each tool is too stable, the influence of variation would be so sensitive, and the mechanism would be too strict. We developed if we combined %Bias criteria...
A Critical Dimension SEM (CD-SEM: Critical Dimension Scanning Electron Microscope) is a dedicated system for measuring the dimensions of the fine patterns formed on a semiconductor wafer. CD-SEM is mainly used in the manufacturing lines of electronic devices of semiconductors. The measurement process includes OM Alignment, SEM Alignment, Addressing, Measurement, and Image Saved. From May 2015, we...
In October 2016, the IATF published a revised automotive industry standard, and the first edition will be referred to as “IATF 16949.” IATF 16949 is aligned with and refers to the most recent standard, ISO 9001:2015, fully respecting its structure and requirements. According to the IATF 16949, the goal of this standard is the development of a quality management system that provides for continual improvement,...
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