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We report on the layout effects in strained SiGe channel FDSOI pMOSFETS down to 20nm gate length. Two SiGe integration schemes are compared: the SiGe-first approach, with Ge-enrichment performed prior to the STI module and the SiGe-last approach using only a SiGe epitaxy after the STI module. We evidence reduced layout effects in the SiGe-last integration featuring Si/SiGe bilayer. SiGe-last shows...
A detailed statistical characterization of drain current local and global variability in sub 15nm gate length Si/SiGe Trigate NW pMOSFETs is carried out. An analytical mismatch model is used to extract the main matching parameters. Our results indicate that, despite their very aggressive dimensions, such devices maintain relatively good variability performance.
In this paper, we present extensive random telegraph signal (RTS) noise characterization in advanced SiGe:C heterojunction bipolar transistors. In frequency domain, in addition to 1/f noise, generation-recombination (G-R) mechanisms are observed at low base bias in the base noise. Their existence is confirmed by RTS noise measurements in time domain. The RTS amplitude evolves rather slowly with bias,...
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