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The effect of postdeposition anneals in various ambients on negative bias temperature instability (NBTI) in metal-organic chemical-vapor-deposited HfSiO(N) stacks is investigated. The nitrided stacks, either by anneal or decoupled plasma nitridation (DPN) followed by a postnitridation anneal in O2 or N2 (DPN + O2 and DPN + N2 ), are more degraded by NBTI than the nonnitrided ones (O2, N2 anneal, and...
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