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This letter focused on MgxZn1−xO thin films grown on quartz substrates using radio frequency magnetron sputtering. The films were then used to fabricate metal–semiconductor–metal ultraviolet (UV) photodetectors (PDs) with different flow rates of argon gas (30, 25, and 20 sccm) and oxygen gas (0, 5, and 10 sccm). We obtained the best parameters for the 25:5 sccm gas flow MgxZn1−xO UV PD. The samples’...
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