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In this letter, a magnetic-field area sensor using poly-Si micro Hall devices is reported. A matrix array of Hall devices is formed on a glass substrate using fabrication processes compatible with poly-Si thin-film transistors. Here, 3 × 3 Hall devices are arrayed every 1 × 1 mm, and the dimension of the principal part is less than 50 × 50 μm. A compensation technique of the characteristic variation...
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