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We explore a novel silicide contact technology for effective Schottky barrier height PhiBn and contact resistance reduction, which is compatible with an advanced silicon-carbon (Si1-xCx) source/drain (S/D) stressor technology. The new silicide contact technology incorporates selenium (Se) that is coimplanted with S/D dopants into the silicon-carbon S/D prior to nickel silicidation, leading to the...
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