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In this paper, a new electroplating mask regarding deep etching on glass was revealed. It consisted of sputtered Chromium and Copper layer with electroplated Chromium and Gold layer, in combination with hard baked thick photoresist AZ4620 mask layer. After more than 3 hours' immerging in the HF etching solution, the etching depth attained more than 500μm. By using hard baking photoresist, the smoother...
This paper describes a novel technique for covering microfluidic systems using Parylene-C. Microfluidic systems consisting of micro channels and reservoirs need to be covered to protect or isolate liquid samples from the environment. Thick photoresist and wax are employed as the sacrificial layers in the enclosed micro channels and reservoirs before Parylene-C sealing. The results show that the melted...
We describe a novel method to measure the thermal conductivity of thick films. Based on the analytical solution of a comprehensive 2-D film-substrate heat diffusion problem, we derived a simple empirical solution for determination of the thick-film thermal conductivity. We use the negative photoresist SU-8 as a thick film material, the use of lithography process and a simple instrument that can be...
With the development of microfabrication, micropatterns attract more and more attentions in cellular biology research. However, fabrication of micron annulus patterns with feature size of several micrometers by the traditional lift-off technique is still tricky. In this work, an aluminum-photoresist dual-layer lift-off process was developed to achieve a high yield and good reproducible gold micropattern...
We present for the first time an approach to fabricate surface enhanced Raman scattering (SERS)-active substrates based on nanofibers simply by removing SU-8 photoresist in oxygen plasma bombardment. Compared with Raman spectral signals of Rhodamine B on smooth silicon substrates, the intensity of those on the nanofiber-based SERS-active substrates are much more distinctive and are at least 103 folds...
In this research work the design and prototyping of novel planar microelectrode arrays that utilize SU-8 as the insulating material is presented. The microelectrode arrays are fabricated as a key component of an extracellular neural recording system comprising a full customized CMOS analog neural signal readout ASIC for neural signal processing and an 8 by 8 microelectrode array for acquiring the...
We present a clean and convenient technology to form a nano-scale archipelago shape upper electrode of capacitive humidity sensor to substitute the lift-off technology in this kind of process. In our fabrication process of humidity sensor, only the 0.25 second of the beginning of the discharge in a sputtering was used to form the nano-scale archipelago shape electrode. Moreover, the humidity sensitive...
In this paper, we demonstrated the detailed fabrication process of taper hollow metallic microneedle array through 2-layer SU-8 thick photoresist based backside exposure and Nickel electroplating techniques. We got microneedles with length in the range of 300 μm to 450 μm, and sharp tips with cone angles in the range of 4.6° to 5.7°. It was found that backside exposure through transparent glass substrate...
A fabrication process of microlens array using multiple plane waves interference is described. Maskless exposure system is superposed on a photoresist coated substrate layer. Multiple plane waves interference is provided by the refractions of gratings. The period of microlens array range from 1um to 10um and the diameter of single microlen can be produced less than the period. Furthermore large area...
This paper develops a novel method to fabricate seamless and complicated patterns of microstructures onto the cylindrical surface of a metal roller. This patterned metal roller can then serve as a roller mold in roll-to-roll (R2R) continuous roller imprinting of microstructures at low-cost, high-speed, and large-area. The first step towards fabricating a seamless roller mold is a pneumatically driven...
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