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We report on all-epitaxial growth of large diameter (3-inch), large aperture (>1.5 mm thick), low-loss (<0.005 cm-1) QPM GaAs. 2-mum-laser-pumped OPO performance was comparable to that of ZnGeP2.
We have achieved superior quality non-tapered InN nanowires on Si(111) by molecular beam epitaxy, which are free of dislocations and exhibit bright photoluminescence at room-temperature and significantly reduced spectral broadening (linewidth~18.5 meV at 77 K).
We will discuss results of InGaN material and device growth by HVPE. Application of new device concepts for LEDs arising from new HVPE capabilities will be discussed, including all-HVPE InGaN based LEDs for SSL.
We present the operation of electrically-injected 1528 nm GaInNAsSb vertical cavity surface emitting lasers grown on GaAs. Pulsed lasing at room temperature and continuous wave lasing at low temperatures are reported for the first time.
We report up to 2.3% biaxial tensile-strained Ge layers grown on InGaAs/GaAs buffer layers. Low-temperature photoluminescence shows a dramatic intensity increase for >2% tensile strained Ge, confirming the existence of a direct band gap Ge.
Nanoheteroepitaxy of InGaN-based light-emitting diodes on patterned AGOG sapphire by using abbreviated growth mode, leads to significant reduction in dislocation density and 24% increase in efficiency.
This work provides motivation and background for work on nonpolar and semipolar GaN-based materials and then highlight UCSB work on growth of nonpolar and semipolar GaN on foreign substrates and on freestanding GaN substrates. UCSB work on nonpolar and semipolar GaN lighting emitting devices, including record 405 nm LED performance, the first nonpolar and semipolar GaN-based laser diodes, the first...
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