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New thin-film range resistors have been developed at the National Metrology Institute of Japan (NMIJ) to reduce the voltage dependence of AC-DC transfer differences that have appeared in the processes of the step-up procedures over 300 V. The occurrence of voltage dependence is partly due to rising ambience temperature that may cause changes in the resistance of the resistor and the temperature dependence...
This paper presents results on the development of metallic ultra thin films on cylindrical alumina substrate, which are the basis of coaxial ac resistors. Ni80Cr20 and Ni75Cr20Al2.5Cu2.5 materials alloy have been used for synthesizing the resistive layers by magnetron sputtering technique. Resistance values as high as 100 k Omega and 200 k Omega have been obtained for both materials respectively over...
In this paper, we present results of direct AC resistance comparisons carried out at LNE with a four terminal-pair coaxial impedance bridge in 1:1 and 10:1 ratios at frequencies up to 1.6 kHz. Various ac calculable resistance standards have been used, having 1 kOmega and 10 kOmega nominal values and different technology designs. LNE standards were a coaxial straight wire resistor of Haddad type and...
Thin film resistors, based on the NiCr alloys, have been fabricated and studied at temperatures down to 50 mK. Resistivity of the films varied within (7-11) Ohm*square depending on additions of Cu, Al and Ge. The resistors demonstrate Kondo minimum at 20 K - 30 K. Power dependence measurements at sub Kelvin temperatures showed an electron overheating at the power level above 10 pW for the Ni75Cr20...
Metal alloy (NiCrCuAlGe) thin film resistors were coated with atomic layer deposited (ALD) alumina (Al2O3) in order to improve the stability and repeatability of the high value resistors (100 kOmega - 500 kOmega) in the temperature range from 4.2 K to 300 K. The drift rate of the resistance due to the native oxidation at room temperature was reduced from -2.45 ppm/h for an uncoated resistor to 0.03...
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