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Novel local curvature test structures combined with a sub-nanometer optical interferometry measuring setup have been developed to detect stresses in nanometer-scale films as well as ultra low stresses in thin films. Stress difference as small as 1.5 MPa within a 30 nm film can be resolved with this metrology, which is among the best in the present reports. Residual stresses in thermal SiO2 and LPCVD...
Study on the relationship between the breakdown voltage and the nano-topography of electrode surface is presented. The bottom electrode is electroplated with three different current densities. The measured RMS roughness for the obtained electrodes is 27.4nm, 16.0nm and 5.4nm correspondingly. PECVD 300degC Si3N4 is deposited onto the electrodes as dielectric layer. After measuring the surface nano-topography...
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